FACTORS CONTROLLING STRUCTURE OF SPUTTERED TA FILMS

被引：102

作者：

FEINSTEIN, LG ^{[1
]}

HUTTEMANN, RD ^{[1
]}

机构：

[1] BELL TEL LABS INC, ALLENTOWN, PA 18103 USA

来源：

关键词：

D O I：

10.1016/0040-6090(73)90163-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：129 / 145

页数：17

共 62 条

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[3] Binger W.W., 1963, CORROSION RESISTANCE
[4] Boruschko M. S., 1970, Wissenschaftliche Zeitschrift der Technischen Hochschule Otto von Guericke Magdeburg, V14, P91
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[7] FACE-CENTERED-CUBIC TUNGSTEN FILMS OBTAINED BY
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[8] FORMATION OF THIN POLYMER FILMS BY ELECTRON BOMBARDMENT
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[9] INVESTIGATION OF SPUTTERED BETA-TANTALUM THIN FILMS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (02): : 80 - &
[10] STRUCTURE AND COMPOSITION OF SPUTTERED TANTALUM THIN-FILMS ON SILICON STUDIED BY NUCLEAR AND X-RAY ANALYSIS
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[J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (04) : 1444 - &