SIMULATION OF X-RAY-DIFFRACTION CURVES FROM ION-IMPLANTED WAFERS AND RELAXED II-VI SUPERLATTICES

被引:6
作者
PESEK, A
KASTLER, P
PALMETSHOFER, L
HAUZENBERGER, F
JUZA, P
FASCHINGER, W
LISCHKA, K
机构
[1] UNIV LINZ,INST EXPTL PHYS,A-4040 LINZ,AUSTRIA
[2] UNIV LINZ,INST HALBLEITERPHYS,A-4040 LINZ,AUSTRIA
关键词
D O I
10.1088/0022-3727/26/4A/037
中图分类号
O59 [应用物理学];
学科分类号
摘要
A simulation program for the calculation of x-ray diffraction curves (Bragg case) on the basis of the dynamical diffraction theory was developed. The strain distribution in the sample is modelled as a sequence of a large number of arbitrarily strained layers with no limitation on the reflectivity of the individual layers. The program was used for the investigation of the strain induced by Ge ions implanted into Si wafers and the strain in short-period II-VI superlattices.
引用
收藏
页码:A177 / A180
页数:4
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