NEUTRON AND X-RAY-DIFFRACTION INVESTIGATIONS OF SILICON IMPLANTED BY PHOSPHORUS IONS

被引:10
作者
EICHHORN, F [1 ]
机构
[1] DAWB,ZENT INST KERN FORSCH,ROSSENDORF,GER DEM REP
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1975年 / 30卷 / 01期
关键词
D O I
10.1002/pssa.2210300116
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:155 / 162
页数:8
相关论文
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