SELF-CLEANING EFFECT IN PARTIALLY IONIZED BEAM DEPOSITION OF CU FILMS

被引：15

作者：

YANG, GR

BAI, P

LU, TM

LAU, WM

机构：

[1] RENSSELAER POLYTECH INST,DEPT PHYS,TROY,NY 12180

[2] UNIV WESTERN ONTARIO,LONDON N6A 5B7,ONTARIO,CANADA

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 09期

关键词：

D O I：

10.1063/1.343954

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4519 / 4521

页数：3

共 17 条

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