INFRARED ABSORPTION OF CHEMICAL VAPOR DEPOSITED BOROSILICATE GLASS FILMS

被引：49

作者：

TAFT, EA

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1971年 / 118卷 / 12期

关键词：

D O I：

10.1149/1.2407891

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1985 / &

共 18 条

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[9] CHEMICAL VAPOR DEPOSITION OF SILICATE GLASSES FOR USE WITH SILICON DEVICES .2. FILM PROPERTIES [J].

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