THERMAL NITRIDATION OF SI(111) BY NITRIC-OXIDE

被引：75

作者：

WIGGINS, MD

BAIRD, RJ

WYNBLATT, P

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 03期

关键词：

D O I：

10.1116/1.570965

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：965 / 970

页数：6

共 31 条

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