SOLID-PHASE EPITAXIAL-GROWTH OF INP ON GAAS

被引:3
作者
MARUYAMA, H
PAK, K
SAKAKIBARA, K
NAKAMURA, M
TAKANO, Y
YONEZU, H
机构
[1] Department of Electrical and Electronic Engineering, Toyohashi University of Technology, Toyohashi, 441, Tempaku-cho
关键词
712 Electronic and Thermionic Materials - 714 Electronic Components and Tubes - 931 Classical Physics; Quantum Theory; Relativity - 933 Solid State Physics;
D O I
10.1016/0022-0248(91)90735-N
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Solid phase epitaxial (SPE) growth of amorphous InP on GaAs was investigated by molecular beam epitaxy. Amorphous InP was obtained at room temperature with a high incident beam flux ratio of P2 to In. The SPE layers show a flat surface without the formation of islands. The subsequent InP epitaxial growth on SPE layers was obtained successfully in a two-dimensional growth mode without island formation.
引用
收藏
页码:180 / 185
页数:6
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