SUPPRESSION OF TWIN FORMATION IN CDTE(111)B EPILAYERS GROWN BY MOLECULAR-BEAM EPITAXY ON MISORIENTED SI(001)

CdTe(111)B layers have been grown on misoriented Si(001). Twin formation inside CdTe(111)B layer is very sensitive to the substrate tilt direction. When Si(001) is tilted toward [110] or [100], a fully twinned layer is obtained. When Si(001) is tilted toward a direction significantly away from [110], a twin-free layer is obtained. Microtwins inside the CdTe(111)B layers are overwhelmingly dominated by the lamellar twins. CdTe(111)B layers always start with heavily lamellar twinning. For twin-free layers, the lamellar twins are gradually suppressed and give way to twin-free CdTe(111)B layer. The major driving forces for suppressing the lamellar twinning are the preferential orientation of CdTe[11 ($) over bar 2] along Si[1 ($) over bar 10] and lattice relaxation. Such preferential orientation is found to exist for the CdTe(111)B layers grown on Si(001) tilted toward a direction between [110] and [100].