ADDITIONAL BIAS EFFECTS ON THE FORMATION OF AMORPHOUS HYDROGENATED CARBON-FILMS BY ECR

Amorphous carbon films with a significant hardness and low compressive internal stress (below 0.1 GPa) were produced by a low temperature chemical vapor deposition (CVD) process at 200°C utilizing an electron cyclotron resonance (ECR). The deposition rate and microhardness of the films formed on glass were 5 nm ·min-1 and 18 GPa, respectively. The additional negative bias up to -200 V was effective to produce hard carbon films above 30 GPa, to increase the deposition rate and to decrease the H/C ratio of carbon films. © 1990 The Japan Society of Applied Physics.