FOCUSED ION-BEAM LITHOGRAPHY WITH TRANSITION-METAL OXIDE RESISTS

被引：14

作者：

KOSHIDA, N ^{[1
]}

OHTAKA, K ^{[1
]}

ANDO, M ^{[1
]}

KOMURO, M ^{[1
]}

ATODA, N ^{[1
]}

机构：

[1] ELECTROTECH LAB,TSUKUBA,IBARAKI 305,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 10期

关键词：

D O I：

10.1143/JJAP.28.2090

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2090 / 2094

页数：5

共 18 条

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[10]

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