INFLUENCE OF DEPOSITION RATE ON ELECTRICAL-PROPERTIES OF THIN TELLURIUM-FILMS

被引：15

作者：

DEVOS, A

AERTS, J

机构：

[1] STATE UNIV GHENT, NATL FONDS WETENSCHAPPLIJK ONDERZOEK, B-9000 GHENT, BELGIUM

[2] STATE UNIV GHENT, ELEKTRON MEETTECH LAB, B-9000 GHENT, BELGIUM

来源：

THIN SOLID FILMS | 1977年 / 46卷 / 02期

关键词：

D O I：

10.1016/0040-6090(77)90066-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：223 / 228

页数：6

共 17 条

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[7] GROWTH OF VACUUM-DEPOSITED TELLURIUM-FILMS ON GLASS SUBSTRATES AND SOME OF THEIR TRANSPORT PROPERTIES [J].

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[8] TRANSPORT PROPERTIES OF TELLURIUM THIN-FILMS AND THEIR DEPENDENCE ON THICKNESS [J].

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[9]

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[10] HALL-MOBILITY OF EVAPORATED TELLURIUM-FILMS [J].

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JAPANESE JOURNAL OF APPLIED PHYSICS, 1973, 12 (12) :1884-1889

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