LOW-TEMPERATURE REFRACTORY-METAL FILM DEPOSITION

被引：81

作者：

SOLANKI, R

BOYER, PK

COLLINS, GJ

机构：

来源：

APPLIED PHYSICS LETTERS | 1982年 / 41卷 / 11期

关键词：

D O I：

10.1063/1.93389

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1048 / 1050

页数：3

共 11 条

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[9] PREPARATION OF X-RAY-LITHOGRAPHY MASKS USING A TUNGSTEN REACTIVE ION ETCHING PROCESS [J].

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APPLIED PHYSICS LETTERS, 1982, 41 (03) :247-248

[10] LASER PHOTODEPOSITION OF REFRACTORY-METALS [J].

SOLANKI, R ;

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COLLINS, GJ .

APPLIED PHYSICS LETTERS, 1981, 38 (07) :572-574

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