THE EFFECTS OF ION BOMBARDING ENERGY ON THE STRUCTURE AND PROPERTIES OF TIN FILMS SYNTHESIZED BY DUAL-ION BEAM SPUTTERING

被引：27

作者：

LI, WZ

HE, XM

LI, HD

机构：

[1] Department of Materials Science and Engineering, Tsinghua University

来源：

JOURNAL OF APPLIED PHYSICS | 1994年 / 75卷 / 04期

关键词：

D O I：

10.1063/1.356299

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

TiN films have been synthesized by dual ion beam sputtering (DIBS) deposition at the temperature below 100-degrees-C. Ion bombardment influenced the metallographic morphology and crystalline orientation of TiN films. TiN film formed under N+ bombardment at low energy (< 1 keV) consisted of fine crystal particles without texture. The film bombarded at 300 eV exhibited a hardness of 2750 kgf/mm2, which was an extremely high value for TiN films currently obtained by ion beam assisted deposition. The tribological tests demonstrated that TiN film synthesized by DIBS possessed good wear resistance.

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页码：2002 / 2006

页数：5

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