FACET OXIDE FORMATION AND DEGRADATION OF GAAS-LASERS

被引:25
作者
NASH, FR
HARTMAN, RL
机构
[1] Bell Laboratories, Murray Hill
关键词
D O I
10.1063/1.326394
中图分类号
O59 [应用物理学];
学科分类号
摘要
It has been suggested that the long-term degradation mode in (Al,Ga)As double-heterostructure lasers is caused by the growth of an optically thick reflectivity-lowering oxide formation on the emissive portion of the mirror facets. We find that the long-term degradation behavior of our superior lasers cannot be explained by this approach. While not ruling out all conceivable models for the oxide growth rate, our conclusions based upon two simple and physically plausible models corroborate our separate experimental study which found that facet oxide formation is not directly relevant to laser reliability in the regime characterized by cw operation in a 70 °C dry-nitrogen ambient and outputs of ∼5 mW/facet for stripe widths equal to 12 μ and lifetimes ≈30 000 h. We have also examined a commonly used expression for the external differential quantum efficiency and find that it has historically been misinterpreted by many workers.
引用
收藏
页码:3133 / 3141
页数:9
相关论文
共 42 条
[1]   REFRACTIVE-INDEX OF A NATIVE OXIDE ANODICALLY GROWN ON GAAS [J].
BARNES, PA ;
SCHINKE, DP .
APPLIED PHYSICS LETTERS, 1977, 30 (01) :26-28
[2]  
BIARD JR, 1964, T METALL SOC AIME, V230, P286
[3]  
BORN, 1959, PRINCIPLES OPTICS, P60
[4]   INFLUENCE OF ALXGA1-XAS LAYER THICKNESS ON THRESHOLD CURRENT-DENSITY AND DIFFERENTIAL QUANTUM EFFICIENCY FOR GAAS-ALXGA1-XAS DH LASERS [J].
CASEY, HC ;
PANISH, MB .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (03) :1393-1395
[5]  
CASEY HC, 1978, J APPL PHYS, V49, P3684, DOI 10.1063/1.325421
[6]   LONG-TERM DEGRADATION OF GAAS-GA1-XALXAS DH LASERS DUE TO FACET EROSION [J].
CHINONE, N ;
NAKASHIMA, H ;
ITO, R .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (03) :1160-1162
[7]   GAIN-INDUCED GUIDING AND ASTIGMATIC OUTPUT BEAM OF GAAS LASERS [J].
COOK, DD ;
NASH, FR .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (04) :1660-1672
[8]   GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON [J].
DEAL, BE ;
GROVE, AS .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) :3770-&
[9]   DEGRADATION OF CW GAAS DOUBLE-HETEROJUNCTION LASERS AT 300-K [J].
DELOACH, BC ;
HAKKI, BW ;
HARTMAN, RL ;
DASARO, LA .
PROCEEDINGS OF THE IEEE, 1973, 61 (07) :1042-1044
[10]   IMPROVED LIGHT-OUTPUT LINEARITY IN STRIPE-GEOMETRY DOUBLE-HETEROSTRUCTURE (AL,GA)AS LASERS [J].
DIXON, RW ;
NASH, FR ;
HARTMAN, RL ;
HEPPLEWHITE, RT .
APPLIED PHYSICS LETTERS, 1976, 29 (06) :372-374