MICRODISTORTION MEASUREMENT IN AU TEXTURED THIN-FILMS BY X-RAY-DIFFRACTION

被引：19

作者：

DURAND, N

BIMBAULT, L

BADAWI, KF

GOUDEAU, P

机构：

来源：

JOURNAL DE PHYSIQUE III | 1994年 / 4卷 / 06期

关键词：

D O I：

10.1051/jp3:1994183

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Microdistorsion analysis in Au 150 nm thin films is presented in this study. Applying the method of the << integral width >>, known and employed in bulk materials, we have shown its feasibility and its interest in the case of thin films. Furthermore, in relation with X-Ray diffraction stress measurement. we found important effects of the deposition conditions on the films microstructure.

引用

页码：1025 / 1032

页数：8

共 13 条

[1] RESIDUAL-STRESS DETERMINATION IN A 1000 A TUNGSTEN THIN-FILMS BY X-RAY-DIFFRACTION
BADAWI, KF
DECLEMY, A
NAUDON, A
GOUDEAU, P
[J]. JOURNAL DE PHYSIQUE III, 1992, 2 (09): : 1741 - 1748
[2] BOUBEKER B, IN PRESS J PHYS 3
[3] Castex L., 1981, DETERMINATION CONTRA, VX
[4] RESIDUAL-STRESS EVOLUTION IN TUNGSTEN THIN-FILMS UNDER IRRADIATION
DURAND, N
BADAWI, KF
GOUDEAU, P
NAUDON, A
[J]. JOURNAL DE PHYSIQUE III, 1994, 4 (01): : 25 - 34
[5] GOLAN Y, 1991, PUB SURF SCI
[6] Guinier A., 1964, THEORIE TECHNIQUE RA
[7] UNCERTAINTY IN THE RESIDUAL-STRESSES ANALYSIS BY X-RAYS DIFFRACTION
KAHLOUN, C
BADAWI, KF
DIOU, A
[J]. REVUE DE PHYSIQUE APPLIQUEE, 1990, 25 (12): : 1225 - 1238
[8] LEIBERICH A, 1991, MRS P, V239, P87
[9] MAEDER G, 1986, CHEM SCRIPTA, V26A, P23
[10] RAVET MF, 1993, SPR P MRS M SAN FRAN

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