DEPOSITION OF MOLYBDENUM CARBONITRIDE THIN-FILMS FROM MO(NBUT)2(NHBUT)2

被引：15

作者：

CHIU, HT

HO, WY

CHUANG, SH

机构：

[1] Department of Applied Chemistry, National Chiao Tung University

来源：

JOURNAL OF MATERIALS RESEARCH | 1994年 / 9卷 / 07期

关键词：

D O I：

10.1557/JMR.1994.1622

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Mo(NBut)2(NHBut)2 is used as a single-source precursor to deposit thin films of cubic phase molybdenum carbonitride, MoC(x)N(y), (x: 0.2-0.55, y: 0.1-0.47), by chemical vapor deposition on silicon substrates. in general, the C/Mo ratios increased from 0.2 to 0.55 and the N/Mo ratios decreased from 0.47 to 0.1 with increasing the temperature of deposition from 773 to 923 K. Based on the elemental composition and the composition of the gas phase products, it is proposed that the carbon atoms were incorporated through beta-methyl activation of the ligands.

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页码：1622 / 1624

页数：3

相关论文

共 14 条

[1] TUNGSTEN NITRIDE THIN-FILMS PREPARED BY MOCVD [J].

CHIU, HT ;

CHUANG, SH .

JOURNAL OF MATERIALS RESEARCH, 1993, 8 (06) :1353-1360

[2] DEPOSITION OF TANTALUM NITRIDE THIN-FILMS FROM ETHYLIMIDOTANTALUM COMPLEX [J].

CHIU, HT ;

CHANG, WP .

JOURNAL OF MATERIALS SCIENCE LETTERS, 1992, 11 (02) :96-98

[3]

CHIU HT, 1993, J MATER SCI LETT, V12, P537

[4]

DANOPOULOS AA, 1992, INORG CHEM, V31, P2287

[5] 4 COORDINATE BIS(IMIDO) ALKENE COMPLEXES OF MOLYBDENUM(IV) - RELATIVES OF THE ZIRCONOCENE FAMILY [J].

DYER, PW ;

GIBSON, VC ;

HOWARD, JAK ;

WHITTLE, B ;

WILSON, C .

JOURNAL OF THE CHEMICAL SOCIETY-CHEMICAL COMMUNICATIONS, 1992, (22) :1666-1668

[6] CHEMICAL VAPOR-DEPOSITION OF TITANIUM, ZIRCONIUM, AND HAFNIUM NITRIDE THIN-FILMS [J].

FIX, R ;

GORDON, RG ;

HOFFMAN, DM .

CHEMISTRY OF MATERIALS, 1991, 3 (06) :1138-1148

[7] SYNTHESIS OF THIN-FILMS BY ATMOSPHERIC-PRESSURE CHEMICAL VAPOR-DEPOSITION USING AMIDO AND IMIDO TITANIUM(IV) COMPOUNDS AS PRECURSORS [J].

FIX, RM ;

GORDON, RG ;

HOFFMAN, DM .

CHEMISTRY OF MATERIALS, 1990, 2 (03) :235-241

[8] ORGANOMETALLIC ROUTE TO THE CHEMICAL VAPOR-DEPOSITION OF TITANIUM CARBIDE FILMS AT EXCEPTIONALLY LOW-TEMPERATURES [J].

GIROLAMI, GS ;

JENSEN, JA ;

POLLINA, DM ;

WILLIAMS, WS ;

KALOYEROS, AE ;

ALLOCCA, CM .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1987, 109 (05) :1579-1580

[9] NEW ORGANOMETALLIC ROUTE TO VANADIUM CARBONITRIDE THIN-FILMS [J].

LAURENT, F ;

MICHEL, P ;

FEURER, R ;

MORANCHO, R ;

VALADE, L ;

CHOUKROUN, R ;

CASSOUX, P .

JOURNAL OF MATERIALS CHEMISTRY, 1993, 3 (06) :659-663

[10] EVALUATION OF TETRA-ALKYLCHROMIUM PRECURSORS FOR ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION .1. FILMS GROWN USING CR[CH2C(CH3)3]4 [J].

MAURY, F ;

OSSOLA, F .

THIN SOLID FILMS, 1992, 207 (1-2) :82-89