A 4-MB CMOS SRAM WITH A PMOS THIN-FILM-TRANSISTOR LOAD CELL

被引:13
作者
OOTANI, T
HAYAKAWA, S
KAKUMU, M
AONO, A
KINUGAWA, M
TAKEUCHI, H
NOGUCHI, K
YABE, T
SATO, K
MAEGUCHI, K
OCHII, K
机构
[1] HEWLETT PACKARD CO,SILICON PROC LAB,PALO ALTO,CA 94304
[2] TOSHIBA MICROELECTR CORP,KAWASAKI,JAPAN
关键词
D O I
10.1109/4.62128
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A 4-Mb (512K words by 8 b) CMOS static RAM (SRAM) with a PMOS thin-film-transistor (TFT) load cell has been developed [12]. Utilizing the PMOS TFT as a memory cell load, the RAM can obtain a much larger data retention margin than a conventional high-resistive load type cell. An internal voltage down converter (VDC) architecture with an external supply voltage level sensor not only realizes a highly reliable 0.5- μm MOS transistor operation but also a sufficiently low standby power dissipation characteristic for data battery-backup application. A self-aligned equalized level sensing scheme can minimize the sensing delay for a local sense amplifier to drive a large load capacitance of a global sensing bus line. The RAM is fabricated using a half-micrometer, triple-poly, and double-aluminum with dual gate oxide thickness CMOS process technology. The RAM operates under a single 5-V supply voltage with 23-ns typical address access time and 20- and 70-mA operation current at 10 and 40 MHz, respectively. © 1990 IEEE
引用
收藏
页码:1082 / 1092
页数:11
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