TEMPERATURE-DEPENDENCE OF IV AND C-V CHARACTERISTICS OF NI/N-CDF2 SCHOTTKY-BARRIER TYPE DIODES

被引:167
作者
COVA, P
SINGH, A
机构
[1] Departamento de Fisica, Universidad de Oriente, Cumana
关键词
21;
D O I
10.1016/0038-1101(90)90003-W
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Current-voltage (I-V) and capacitance-voltage (C-V) measurements were performed in the temperature range 45-330 K on Ni/n-CdF2 Schottky barrier type diodes fabricated on unpolished CdF2 surface, etched with 1 : HCl. The diodes showed an MIS structure with interface states and deep donor bulk defects. Under forward bias and for T ≥ 280 K, the electric current transport was controlled by the thermionic emission process. However, for T ≤ 280 K, the current was controlled by thermionic field emission. The zero bias and zero temperature barrier height, φ0 = (0.67 ± 0.07) V was obtained from the I-V measurements and agreed very well with the value of φ0 = (0.60 ± 0.06) V, determined from the C-V data. The energy density of interface states estimated from the room temperature I-V measurements was ≈ 1012 cm-2 eV-1. The interface states were responsible for the non-ideal behavior of the forward I-V characteristics of the diodes. However, the non-linearity in the C-2 vs V curves under reverse bias was introduced by the deep donor levels. From the C-V measurements under reverse bias, two deep levels with energies of EC - (0.7 ± 0.1) eV and EC - (1.0 ± 0.1) eV were detected. © 1990.
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页码:11 / 19
页数:9
相关论文
共 20 条
[1]  
ASHOK S, 1979, SOLID ST ELECTRON, V22
[2]  
AXE JD, 1965, PHYS REV, V139, P1211
[5]   STUDIES OF TUNNEL MOS DIODES .2. THERMAL EQUILIBRIUM CONSIDERATIONS [J].
CARD, HC ;
RHODERICK, EH .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1971, 4 (10) :1602-+
[6]   STUDIES OF TUNNEL MOS DIODES .1. INTERFACE EFFECTS IN SILICON SCHOTTKY DIODES [J].
CARD, HC ;
RHODERICK, EH .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1971, 4 (10) :1589-+
[7]   NORMALIZED THERMIONIC-FIELD (T-F) EMISSION IN METAL-SEMICONDUCTOR (SCHOTTKY) BARRIERS [J].
CROWELL, CR ;
RIDEOUT, VL .
SOLID-STATE ELECTRONICS, 1969, 12 (02) :89-&
[9]   INTERFACE STATES IN MOS STRUCTURES WITH 20-40 A THICK SIO2 FILMS ON NONDEGENERATE SI [J].
KAR, S ;
DAHLKE, WE .
SOLID-STATE ELECTRONICS, 1972, 15 (02) :221-+
[10]   FAST CAPACITANCE TRANSIENT APPARATUS - APPLICATION TO ZNO AND O CENTERS IN GAP PARANORMAL JUNCTIONS [J].
LANG, DV .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (07) :3014-3022