INTER-DIFFUSION OF TITANIUM AND GOLD - A COMPARISON OF THIN-FILMS DEPOSITED IN TECHNICAL VACUUM AND ULTRAHIGH-VACUUM

被引：20

作者：

ASHWELL, GWB

HECKINGBOTTOM, R

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 03期

关键词：

D O I：

10.1149/1.2127475

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

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页码：649 / 654

页数：6

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