THERMALLY STABLE OHMIC CONTACTS TO N-TYPE GAAS .4. ROLE OF NI ON NILNW CONTACTS

被引：24

作者：

SHIH, YC ^{[1
]}

MURAKAMI, M ^{[1
]}

PRICE, WH ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,DIV RES,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 09期

关键词：

D O I：

10.1063/1.342628

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：3539 / 3545

页数：7

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