ELECTRON-SPIN-RESONANCE STUDY OF RADIATION-INDUCED POINT-DEFECTS IN NITRIDED AND REOXIDIZED NITRIDED OXIDES

被引:25
作者
YOUNT, JT [1 ]
LENAHAN, PM [1 ]
DUNN, GJ [1 ]
机构
[1] US DEPT STATE,AMER EMBASSY,ROME,ITALY
关键词
D O I
10.1109/23.211423
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
X-ray irradiated oxide, nitrided oxide, and reoxidized nitrided oxide films were studied with electron spin resonance. Nitridation of oxide films reduces the density of radiation-induced E' centers and creates bridging nitrogen center precursors, while reoxidation of nitrided oxides increases the number of radiation-induced E' centers, reduces the number of bridging nitrogen center precursors, and introduces overcoordinated nitrogen center-precursors. Nitridation and reoxidation of these films also changes the distribution of the radiation-induced defects. Our evidence supports earlier findings that the bridging nitrogen defect plays an important role in electron trapping in nitrided oxides and that the dominant hole trap in reoxidized nitrided oxides is not the E' center. Exposure to molecular hydrogen at room temperature annihilates paramagnetism of the nitrogen-associated centers and reduces that of the E' centers.
引用
收藏
页码:2211 / 2219
页数:9
相关论文
共 66 条
[1]   HOLE TRANSPORT IN SIO2 AND REOXIDIZED NITRIDED SIO2 GATE INSULATORS AT LOW-TEMPERATURE [J].
BOESCH, HE ;
DUNN, GJ .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1991, 38 (06) :1083-1088
[2]   JAHN-TELLER-DISTORTED NITROGEN DONOR IN LASER-ANNEALED SILICON [J].
BROWER, KL .
PHYSICAL REVIEW LETTERS, 1980, 44 (24) :1627-1629
[3]   IMPURITY BARRIER PROPERTIES OF REOXIDIZED NITRIDED OXIDE-FILMS FOR USE WITH P+-DOPED POLYSILICON GATES [J].
CABLE, JS ;
MANN, RA ;
WOO, JCS .
IEEE ELECTRON DEVICE LETTERS, 1991, 12 (03) :128-130
[4]   IDENTIFICATION OF A PARAMAGNETIC NITROGEN DANGLING BOND DEFECT IN NITRIDED SILICON DIOXIDE FILMS ON SILICON [J].
CHAIYASENA, IA ;
LENAHAN, PM ;
DUNN, GJ .
APPLIED PHYSICS LETTERS, 1991, 58 (19) :2141-2143
[5]  
CHAIYASENA IA, 1992, J APPL PHYS, V72, P1
[6]   TRAPPING AND TRAP CREATION STUDIES ON NITRIDED AND REOXIDIZED-NITRIDED SILICON DIOXIDE FILMS ON SILICON [J].
DIMARIA, DJ ;
STATHIS, JH .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (03) :1500-1509
[7]   RECOVERY OF HOT-CARRIER DAMAGE IN REOXIDIZED NITRIDED OXIDE MOSFETS [J].
DOYLE, BS ;
DUNN, GJ .
IEEE ELECTRON DEVICE LETTERS, 1992, 13 (01) :38-40
[8]   DYNAMIC HOT-CARRIER STRESSING OF REOXIDIZED NITRIDED OXIDE [J].
DOYLE, BS ;
DUNN, GJ .
IEEE ELECTRON DEVICE LETTERS, 1991, 12 (02) :63-65
[9]   REOXIDIZED NITRIDED OXIDES (RNOS) FOR LATENT ESD-RESISTANT MOSFET DIELECTRICS [J].
DOYLE, BS ;
MISTRY, KR ;
DUNN, GJ .
IEEE ELECTRON DEVICE LETTERS, 1991, 12 (04) :184-186
[10]   EFFECT OF SYNCHROTRON X-RAY-RADIATION ON THE CHANNEL HOT-CARRIER RELIABILITY OF REOXIDIZED NITRIDED SILICON DIOXIDE [J].
DUNN, GJ .
IEEE ELECTRON DEVICE LETTERS, 1991, 12 (01) :8-9