OBSERVATION OF A VACUUM TUNNEL GAP IN A TRANSMISSION ELECTRON-MICROSCOPE USING A MICROMECHANICAL TUNNELING MICROSCOPE

被引：37

作者：

LUTWYCHE, MI

WADA, Y

机构：

[1] Advanced Research Laboratory, Hitachi, Ltd., Hatoyama

来源：

APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 21期

关键词：

D O I：

10.1063/1.113482

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This letter reports the observation of the vacuum tunnel gap between two conductors using a high resolution transmission electron microscope. A 2.5 mm square micromachined tunneling microscope chip has been fabricated with a minimum feature size of 0.4 μm. The chip fits into a modified side-entry type transmission electron microscope holder. The tunnel gap is controlled by a purpose-built feedback controller. The micromachines work reliably during observation of the tip apex in a transmission electron microscope, allowing the voltage and current to be changed while the tunnel gap is observed.© 1995 American Institute of Physics.

引用

页码：2807 / 2809

页数：3

共 14 条

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