GROWTH OF AMORPHOUS-GERMANIUM NITRIDE FILMS BY INDIRECT-PLASMA ENHANCED CVD

被引：11

作者：

ALFORD, DB

MEINERS, LG

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 04期

关键词：

D O I：

10.1149/1.2100608

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：979 / 980

页数：2

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