共 28 条
SOME PROPERTIES OF VAPOR DEPOSITED GE3N4 FILMS AND GE3N4-GE INTERFACE
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YASHIRO, T
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D O I:
10.1149/1.2404328
中图分类号:
O646 [电化学、电解、磁化学];
学科分类号:
081704 ;
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页码:780 / &
相关论文
共 28 条
[1]
SOME PROPERTIES OF VAPOR DEPOSITED SILICON NITRIDE FILMS USING SIH4-NH3-H2 SYSTEM
[J].
BEAN, KE
;
GLEIM, PS
;
YEAKLEY, RL
;
RUNYAN, WR
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967, 114 (07)
:733-&

BEAN, KE
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GLEIM, PS
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h-index: 0

YEAKLEY, RL
论文数: 0 引用数: 0
h-index: 0

RUNYAN, WR
论文数: 0 引用数: 0
h-index: 0
[2]
PROPERTIES OF SIXOYNZ FILMS ON SI
[J].
BROWN, DM
;
GRAY, PV
;
HEUMANN, FK
;
PHILIPP, HR
;
TAFT, EA
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968, 115 (03)
:311-&

BROWN, DM
论文数: 0 引用数: 0
h-index: 0
机构: General Electric Research and Development Center, Schenectady, New York

GRAY, PV
论文数: 0 引用数: 0
h-index: 0
机构: General Electric Research and Development Center, Schenectady, New York

HEUMANN, FK
论文数: 0 引用数: 0
h-index: 0
机构: General Electric Research and Development Center, Schenectady, New York

PHILIPP, HR
论文数: 0 引用数: 0
h-index: 0
机构: General Electric Research and Development Center, Schenectady, New York

TAFT, EA
论文数: 0 引用数: 0
h-index: 0
机构: General Electric Research and Development Center, Schenectady, New York
[3]
PREPARATION AND PROPERTIES OF AMORPHOUS SILICON NITRIDE FILMS
[J].
CHU, TL
;
LEE, CH
;
GRUBER, GA
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967, 114 (07)
:717-&

CHU, TL
论文数: 0 引用数: 0
h-index: 0

LEE, CH
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h-index: 0

GRUBER, GA
论文数: 0 引用数: 0
h-index: 0
[4]
PREPARATION AND C-V CHARACTERISTICS OF SI-SI3N4 AND SI-SIO2-SI3N4 STRUCTURES
[J].
CHU, TL
;
SZEDON, JR
;
LEE, CH
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SOLID-STATE ELECTRONICS,
1967, 10 (09)
:897-&

CHU, TL
论文数: 0 引用数: 0
h-index: 0

SZEDON, JR
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h-index: 0

LEE, CH
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h-index: 0
[5]
ELECTRICAL PROPERTIES OF VAPOR-DEPOSITED SILICON NITRIDE AND SILICON OXIDE FILMS ON SILICON
[J].
DEAL, BE
;
FLEMING, PJ
;
CASTRO, PL
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968, 115 (03)
:300-&

DEAL, BE
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FLEMING, PJ
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CASTRO, PL
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h-index: 0
[6]
CHARACTERISTICS OF FAST SURFACE STATES ASSOCIATED WITH SIO2-SI AND SI3N4-SIO2-SI STRUCTURES
[J].
DEAL, BE
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MACKENNA, EL
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CASTRO, PL
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1969, 116 (07)
:997-&

DEAL, BE
论文数: 0 引用数: 0
h-index: 0
机构: Fairchild Semiconductor Research and Development Laboratory, Palo Alto, California

MACKENNA, EL
论文数: 0 引用数: 0
h-index: 0
机构: Fairchild Semiconductor Research and Development Laboratory, Palo Alto, California

CASTRO, PL
论文数: 0 引用数: 0
h-index: 0
机构: Fairchild Semiconductor Research and Development Laboratory, Palo Alto, California
[7]
CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON
[J].
DEAL, BE
;
SKLAR, M
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GROVE, AS
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SNOW, EH
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967, 114 (03)
:266-+

DEAL, BE
论文数: 0 引用数: 0
h-index: 0

SKLAR, M
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h-index: 0

GROVE, AS
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h-index: 0

SNOW, EH
论文数: 0 引用数: 0
h-index: 0
[8]
PROPERTY CHANGES IN PYROLYTIC SILICON NITRIDE WITH REACTANT COMPOSITION CHANGES
[J].
DOO, VY
;
KERR, DR
;
NICHOLS, DR
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968, 115 (01)
:61-&

DOO, VY
论文数: 0 引用数: 0
h-index: 0

KERR, DR
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h-index: 0

NICHOLS, DR
论文数: 0 引用数: 0
h-index: 0
[9]
INTERFACE PROPERTIES OF SI-(SIO2)-AL2 O3 STRUCTURES
[J].
DUFFY, MT
;
REVESZ, AG
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970, 117 (03)
:372-+

DUFFY, MT
论文数: 0 引用数: 0
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REVESZ, AG
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h-index: 0
[10]
DENSITY OF SIO2-SI INTERFACE STATES - (MOS DEVICES SI OXIDATION 100 DEGREES C O2 + 80 PPM H2O FERMI LEVEL E)
[J].
GRAY, PV
;
BROWN, DM
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APPLIED PHYSICS LETTERS,
1966, 8 (02)
:31-&

GRAY, PV
论文数: 0 引用数: 0
h-index: 0

BROWN, DM
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