CHARACTERIZATION OF PLASMA-DEPOSITED SILICON-NITRIDE FILMS

被引：47

作者：

YOKOYAMA, S ^{[1
]}

KAJIHARA, N ^{[1
]}

HIROSE, M ^{[1
]}

OSAKA, Y ^{[1
]}

YOSHIHARA, T ^{[1
]}

ABE, H ^{[1
]}

机构：

[1] MITSUBISHI ELECT CORP,LSI DEV LAB,ITAMI,HYOGO 664,JAPAN

来源：

基金：

美国国家科学基金会;

关键词：

D O I：

10.1063/1.327505

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5470 / 5474

页数：5

共 15 条

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[9] SOME APPLICATIONS OF INTENSITY MEASUREMENTS IN THE INFRA-RED
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