DEPENDENCE OF THE COLUMNAR STRUCTURE OF OBLIQUELY EVAPORATED SIOX THIN-FILMS ON THE ANGLE OF DEPOSITION AND THE RATE OF CONDENSATION

被引：4

作者：

GESZTI, O ^{[1
]}

GOSZTOLA, L ^{[1
]}

SEYFRIED, E ^{[1
]}

机构：

[1] ENTERPRISE MICROELECTR,H-1325 BUDAPEST,HUNGARY

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1987年 / 90卷 / 1-3期

关键词：

D O I：

10.1016/S0022-3093(87)80434-9

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：315 / 318

页数：4

共 9 条

[1]

BARNA A, 1986, MATERIALS RES SOC S, V61

[2] COLUMNAR MICROSTRUCTURE IN VAPOR-DEPOSITED THIN-FILMS [J].

DIRKS, AG ;

LEAMY, HJ .

THIN SOLID FILMS, 1977, 47 (03) :219-233

[3] CROSS-SECTIONAL TRANSMISSION ELECTRON-MICROSCOPY STUDY OF OBLIQUELY EVAPORATED SILICON-OXIDE THIN-FILMS [J].

GESZTI, O ;

GOSZTOLA, L ;

SEYFRIED, E .

THIN SOLID FILMS, 1986, 136 (02) :L35-L38

[4]

GOODMAN LA, 1977, IEEE T ELECTRON DEV, V24, P795, DOI 10.1109/T-ED.1977.18832

[5]

MULLER KH, 1985, J APPL PHYS, V58, P2573, DOI 10.1063/1.335885

[6] EFFECT OF VAPOR INCIDENCE ANGLES ON PROFILE AND PROPERTIES OF CONDENSED FILMS [J].

NAKHODKIN, NG ;

SHALDERVAN, AI .

THIN SOLID FILMS, 1972, 10 (01) :109-+

[7] COMPUTER-SIMULATION OF THIN-FILM GROWTH - APPLYING THE RESULTS TO OPTICAL COATINGS [J].

SIKKENS, M ;

HODGKINSON, IJ ;

HOROWITZ, F ;

MACLEOD, HA ;

WHARTON, JJ .

OPTICAL ENGINEERING, 1986, 25 (01) :142-147

[8] THE TEMPERATURE-DEPENDENCE OF LIQUID-CRYSTAL TILT ANGLES [J].

VANSPRANG, HA ;

AARTSEN, RG .

JOURNAL OF APPLIED PHYSICS, 1984, 56 (02) :251-262

[9]

YAMASHITA M, 1976, JPN J APPL PHYS, V15, P2087, DOI 10.1143/JJAP.15.2087

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