POLY(ARYLINE IMIDE)S AS E-BEAM RESIST - SENSITIVITY AND RESOLUTION

被引：4

作者：

CHIEN, JCW

GONG, BM

机构：

来源：

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY | 1989年 / 27卷 / 10期

关键词：

D O I：

10.1002/pola.1989.080271013

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：3343 / 3352

页数：10

共 18 条

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[10] MECHANISTIC STUDY OF RADIATION-INDUCED DEPOLYMERIZATION OF POLY(CHLOROACETALDEHYDE) [J].

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