INTRINSIC STRESS IN THIN-FILMS OF AG, AL, ZNS AND LIF

被引：12

作者：

LAUGIER, M ^{[1
]}

机构：

[1] UNIV AIX MARSEILLE,CTR ST JEROME,ELECTROTECH LAB,F-13397 MARSEILLE,FRANCE

来源：

JOURNAL OF MATERIALS SCIENCE | 1980年 / 15卷 / 05期

关键词：

D O I：

10.1007/BF00551803

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1147 / 1152

页数：6

共 28 条

[1] EFFECT OF IMPURITIES ON INTRINSIC STRESS IN THIN NI FILMS [J].

ALEXANDER, PM ;

HOFFMAN, RW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :96-98

[2] DEVELOPMENT OF STRESS AND SURFACE TEMPERATURE DURING DEPOSITION OF LITHIUM FLUORIDE FILMS [J].

BLACKBURN, H ;

CAMPBELL, DS .

PHILOSOPHICAL MAGAZINE, 1963, 8 (89) :823-+

[3]

BLACKBURN H, 1961, 8TH T NAT VAC S

[4] CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J].

BRENNER, A ;

SENDEROFF, S .

JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02) :105-123

[5]

Campbell D.S., 1969, HDB THIN FILM TECHNO

[6] Stress in Alkali Halide Films [J].

Carpenter, R. ;

Campbell, D. S. .

JOURNAL OF MATERIALS SCIENCE, 1967, 2 (02) :173-183

[7] GRAIN-GROWTH AND STRESS RELIEF IN THIN-FILMS [J].

CHAUDHAR.P .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :520-&

[8]

DAVIDENKOV NN, 1961, SOV PHYS-SOL STATE, V2, P2595

[9] ORIGINS OF STRESS IN THIN NICKEL FILMS [J].

DOLJACK, FA ;

HOFFMAN, RW .

THIN SOLID FILMS, 1972, 12 (01) :71-&

[10] POSSIBLE INFLUENCE OF ELECTRIC CHARGE EFFECTS ON INITIAL GROWTH PROCESSES OCCURRING DURING VAPOR DEPOSITION OF METAL FILMS ONTO SUBSTRATES INSIDE ELECTRON MICROSCOPE [J].

DOVE, DB .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) :2785-&

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