MICROSTRUCTURES OF HYDROGENATED SILICON FILMS PREPARED BY ION PLATING

被引：5

作者：

SHIMIZU, H

MIZUNO, S

NODA, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1986年 / 25卷 / 06期

关键词：

D O I：

10.1143/JJAP.25.775

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：775 / 778

页数：4

共 8 条

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[7] FORMATION OF MICROCRYSTALLINE STRUCTURE IN A-SI-H FILMS PREPARED BY RF SPUTTERING [J].

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[8] MICROSTRUCTURES AND HYDROGEN-BONDING ENVIRONMENTS OF SPUTTER-DEPOSITED A-SI-H FILMS [J].

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