A HEAVY NEGATIVE-ION SPUTTER SOURCE - PRODUCTION MECHANISM OF NEGATIVE-IONS AND THEIR APPLICATIONS

被引：9

作者：

ISHIKAWA, J

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 37-8卷

关键词：

D O I：

10.1016/0168-583X(89)90133-X

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：38 / 44

页数：7

共 18 条

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[7] NEGATIVE-ION SOURCE (NIABNIS) AND PREPARATION OF TRANSPARENT CARBON-FILMS BY NEGATIVE CARBON ION-BEAM DEPOSITION [J].

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[8] TRANSPARENT CARBON-FILM PREPARED BY MASS-SEPARATED NEGATIVE-CARBON-ION-BEAM DEPOSITION [J].

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[9] MASS-SEPARATED NEGATIVE-ION-BEAM DEPOSITION SYSTEM [J].

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[10] AXIAL MAGNETIC-FIELD EXTRACTION-TYPE MICROWAVE ION-SOURCE WITH A PERMANENT-MAGNET [J].

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