MEASUREMENTS OF PLASMA CONTROLLED BY COMPRESSED MAGNETIC-FIELD MAGNETRON SPUTTERING TECHNIQUE

被引：11

作者：

IDO, S ^{[1
]}

ISHIDA, Y ^{[1
]}

HIJIKATA, K ^{[1
]}

机构：

[1] MITSUBISHI MAT CORP,CENT RES INST,1-297 KITABUKURO CHO,OMIYA,SAITAMA 330,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 5A期

关键词：

SPUTTERING; MAGNETRON; EROSION; COMPRESSED MAGNETIC FIELD; DRIFT; ELECTRON DENSITY; MEASUREMENTS;

D O I：

10.1143/JJAP.32.2112

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Measurements of the electron density of plasma and the magnetic field were carried out in a compressed magnetic field-magnetron sputtering system using a non-ferromagnetic material target. The electron density has its maximum in the region where the lines of magnetic force are parallel to the target surface, where the peak of erosion profile is observed. It was found that the peak position of the profiles of electron density and erosion could be controlled using this system.

引用

页码：2112 / 2115

页数：4

共 4 条

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[2] NEW METHOD TO CONTROL COMPOSITION RATIO OF ALLOY-FILMS BY COMPRESSED MAGNETIC-FIELD MAGNETRON SPUTTERING TECHNIQUE [J].

HATA, T ;

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[3] ELECTROSTATIC-PROBE MEASUREMENTS IN THE GLOW-DISCHARGE PLASMA OF A DC MAGNETRON SPUTTERING SYSTEM [J].

PETROV, I ;

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IVANOV, I ;

KOURTEV, J .

CONTRIBUTIONS TO PLASMA PHYSICS, 1988, 28 (02) :157-167

[4]

TEII S, 1986, PURAZUMA KISO KOGAKU, P189

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