SINGLE PULSE LASER ANNEALING OF A DOUBLE-IMPLANTED LAYER

被引：1

作者：

OHKURA, M

NATSUAKI, N

TAMURA, M

TOKUYAMA, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 02期

关键词：

D O I：

10.1143/JJAP.19.L83

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L83 / L86

页数：4

共 13 条

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