STRUCTURAL STUDIES OF THIN NICKEL FILMS ON SILICON SURFACES

被引：32

作者：

SCHAFFER, WJ

BENE, RW

WALSER, RM

机构：

[1] UNIV TEXAS,DEPT ELECT ENGN,AUSTIN,TX 78712

[2] UNIV TEXAS,ELECTR RES CTR,AUSTIN,TX 78712

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 04期

关键词：

D O I：

10.1116/1.569760

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1325 / 1331

页数：7

共 27 条

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