DENSIFICATION OF SIPOS

[1] BRUEGEL W, 1962, INTRO INFRARED SPECT, P301

[2] COLUMNAR MICROSTRUCTURE IN VAPOR-DEPOSITED THIN-FILMS [J]. THIN SOLID FILMS, 1977, 47 (03) : 219 - 233

[3] CRYSTALLOGRAPHIC STUDY OF SEMI-INSULATING POLYCRYSTALLINE SILICON (SIPOS) DOPED WITH OXYGEN-ATOMS [J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) : 3987 - 3992

[4] MAXWELL HC, COMMUNICATION

[5] MAXWELL HR, 1978, J ELCHEM SO, V125, pC257

[6] MAXWELL HR, 1979, MAY EL SOC M BOST

[7] MAXWELL HR, 1978, SEMICONDUCTOR CHARAC, P180

[8] EFFECTS OF OXYGEN DOPING AND SUBSEQUENT ANNEALING IN NITROGEN ON THE STRUCTURE OF POLYCRYSTALLINE SILICON [J]. APPLIED PHYSICS LETTERS, 1979, 34 (09) : 601 - 604

[9] MOCHIZUKI M, 1976, J JAPAN SOC APPL P S, V15, P41

[10] COMPARISON OF PROPERTIES OF DIELECTRIC FILMS DEPOSITED BY VARIOUS METHODS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (05): : 1064 - 1081

[1] BRUEGEL W, 1962, INTRO INFRARED SPECT, P301

[2] COLUMNAR MICROSTRUCTURE IN VAPOR-DEPOSITED THIN-FILMS [J]. THIN SOLID FILMS, 1977, 47 (03) : 219 - 233

[3] CRYSTALLOGRAPHIC STUDY OF SEMI-INSULATING POLYCRYSTALLINE SILICON (SIPOS) DOPED WITH OXYGEN-ATOMS [J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) : 3987 - 3992

[4] MAXWELL HC, COMMUNICATION

[5] MAXWELL HR, 1978, J ELCHEM SO, V125, pC257

[6] MAXWELL HR, 1979, MAY EL SOC M BOST

[7] MAXWELL HR, 1978, SEMICONDUCTOR CHARAC, P180

[8] EFFECTS OF OXYGEN DOPING AND SUBSEQUENT ANNEALING IN NITROGEN ON THE STRUCTURE OF POLYCRYSTALLINE SILICON [J]. APPLIED PHYSICS LETTERS, 1979, 34 (09) : 601 - 604

[9] MOCHIZUKI M, 1976, J JAPAN SOC APPL P S, V15, P41

[10] COMPARISON OF PROPERTIES OF DIELECTRIC FILMS DEPOSITED BY VARIOUS METHODS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (05): : 1064 - 1081