CHARACTERIZATION OF ALUMINUM-BASED OXIDE LAYERS FORMED BY MICROWAVE PLASMA

被引：25

作者：

KATZTSAMERET, Z ^{[1
]}

RAVEH, A ^{[1
]}

机构：

[1] NUCL RES CTR NEGEV, DIV CHEM, IL-84190 BEER SHEVA, ISRAEL

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1995年 / 13卷 / 03期

关键词：

D O I：

10.1116/1.579597

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1121 / 1127

页数：7

共 38 条

[21]

MONDOLFO LF, 1976, ALUMINUM ALLOYS STRU, P343

[22] EVIDENCE FOR OXYGEN BUBBLES IN SUBSURFACE AL2O3 LAYERS FORMED IN ALUMINUM BY OXYGEN IMPLANTATION [J].

MUSKET, RG ;

BROWN, DW ;

PINIZZOTTO, RF .

APPLIED PHYSICS LETTERS, 1986, 49 (07) :379-381

[23] SURFACE-ANALYSIS OF OXIDIZED ALUMINUM .1. HYDRATION OF AL2O3 AND DECOMPOSITION OF AL(OH)3 IN A VACUUM AS STUDIED BY ESCA [J].

NYLUND, A ;

OLEFJORD, I .

SURFACE AND INTERFACE ANALYSIS, 1994, 21 (05) :283-289

[24] FORMATION OF KAPPA-AL203 AND KAPPA-AL2O3 FROM DEHYDRATION OF TOHDITE 5AL2O3.H2O [J].

OKUMIYA, M ;

YAMAGUCH.G ;

YAMADA, O ;

ONO, S .

BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1971, 44 (02) :418-+

[25] SURFACE-ANALYSIS OF OXIDIZED ALUMINUM .2. OXIDATION OF ALUMINUM IN DRY AND HUMID ATMOSPHERE STUDIED BY ESCA, SEM, SAM AND EDX [J].

OLEFJORD, I ;

NYLUND, A .

SURFACE AND INTERFACE ANALYSIS, 1994, 21 (05) :290-297

[26] SURFACE HYDROXYL GROUPS ON GAMMA-ALUMINA [J].

PERI, JB ;

HANNAN, RB .

JOURNAL OF PHYSICAL CHEMISTRY, 1960, 64 (10) :1526-1530

[27] RF PLASMA NITRIDING OF TI-6A1-4V ALLOY [J].

RAVEH, A ;

AVNI, R ;

GRILL, A .

THIN SOLID FILMS, 1990, 186 (02) :241-256

[28] MECHANISM OF RF PLASMA NITRIDING OF TI-6AL-4V ALLOY [J].

RAVEH, A .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1993, 167 (1-2) :155-164

[29] AN XPS STUDY OF THE OXIDATION OF ALAS THIN-FILMS GROWN BY MBE [J].

TAYLOR, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :751-755

[30]

THOMPSON VS, 1968, AM CERAM SOC BULL, V47, P637

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