HIGHLY STRAINED GAAS/INGAAS/ALAS RESONANT TUNNELING DIODES WITH SIMULTANEOUSLY HIGH PEAK CURRENT DENSITIES AND PEAK-TO-VALLEY RATIOS AT ROOM-TEMPERATURE

被引:18
作者
KAPRE, RM [1 ]
MADHUKAR, A [1 ]
GUHA, S [1 ]
机构
[1] UNIV SO CALIF,DEPT MAT SCI & ENGN,LOS ANGELES,CA 90089
关键词
D O I
10.1063/1.104943
中图分类号
O59 [应用物理学];
学科分类号
摘要
Highly strained In0.33Ga0.67As/AlAs-based resonant tunneling diodes have been fabricated on GaAs(100)substrates without the use of thick strain relieving buffer layers. These structures exhibit a simultaneously high peak current density (J(p)) of 125 kA/cm2 and a peak to valley ratio (PVR) of 4.7 A PVR of 5.9 with J(p) = 73 kA/cm2 is observed on some devices, the highest PVR seen for such devices. The excellent resonant tunneling characteristics of these devices are attributed to accurate device design using a GAMMA-X-GAMMA-X-GAMMA resonant tunneling path and to high quality interfaces obtained through the use of optimized growth conditions.
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页码:2255 / 2257
页数:3
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