AN INVESTIGATION OF THE THICKNESS VARIATION OF SPUN-ON THIN-FILMS COMMONLY ASSOCIATED WITH THE SEMICONDUCTOR INDUSTRY

被引：94

作者：

DAUGHTON, WJ ^{[1
]}

GIVENS, FL ^{[1
]}

机构：

[1] TEXAS INSTRUMENTS INC,DALLAS,TX 75265

来源：

关键词：

D O I：

10.1149/1.2123749

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：173 / 179

页数：7

共 19 条

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[7] KELLY R, 1965, JUN P KOD SEM MICR R
[8] Kleinschmidt L.R., 1953, B AM SCI TESTING MAT, V193, P53
[9] MARTINSON LR, 1965, JUN P KOD SEM MICR R
[10] CHARACTERISTICS OF RESIST FILMS PRODUCED BY SPINNING
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[J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) : 3993 - 3997