PREDICTED MODIFICATIONS IN THE DIRECT AND INDIRECT GAPS OF SI

被引:4
作者
BOUHAFS, B
AOURAG, H
机构
[1] Computational Materials Science Laboratory, Physics Department, University of Sidi-Bel-Abbes
关键词
SEMICONDUCTORS; ELECTRONIC BAND STRUCTURE; ELECTRONIC STAKES (LOCALIZED);
D O I
10.1016/0038-1098(95)00268-5
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We have studied the effects of expansion of the lattice on fundamental band gaps in Si, with the use of an adjusted pseudopotential method. The results show that Si structure becomes a direct band gap. A correlation is given with the properties of tetrahedrally filled semiconductors and those of porous silicon.
引用
收藏
页码:245 / 250
页数:6
相关论文
共 37 条
[1]   THE CORRELATION BETWEEN CHARGE-DENSITIES AND INTERSTITIAL IMPURITIES IN ALP AND ALAS [J].
AOURAG, H ;
BELAIDI, A ;
KHELIFA, B ;
GAMOUDI, M ;
JARDIN, C .
PHYSICS LETTERS A, 1990, 149 (5-6) :305-310
[2]   ELECTRON AND POSITRON DISTRIBUTIONS IN GRAY TIN [J].
AOURAG, H ;
SOUDINI, B ;
KHELIFA, B ;
BELAIDI, A .
PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1990, 161 (02) :685-695
[3]   CORRELATION BETWEEN SUBSTITUTION AND INTERSTITIAL DOPING IN ZNXHG1-XTE [J].
AOURAG, H ;
HAMMADI, M ;
KHELIFA, B .
MATERIALS CHEMISTRY AND PHYSICS, 1993, 33 (3-4) :197-203
[4]   VALENCE AND CONDUCTION BAND-EDGES - CHARGE-DENSITIES IN DIAMOND [J].
AOURAG, H ;
MERAD, G ;
KHELIFA, B ;
MAHMOUDI, A .
MATERIALS CHEMISTRY AND PHYSICS, 1991, 28 (04) :431-435
[5]   ELECTROREFLECTANCE OF GAAS AND GAP TO 27 EV USING SYNCHROTRON RADIATION [J].
ASPNES, DE ;
OLSON, CG ;
LYNCH, DW .
PHYSICAL REVIEW B, 1975, 12 (06) :2527-2538
[6]   RELATIVISTIC AND CORE-RELAXATION EFFECTS ON THE ENERGY-BANDS OF GALLIUM-ARSENIDE AND GERMANIUM [J].
BACHELET, GB ;
CHRISTENSEN, NE .
PHYSICAL REVIEW B, 1985, 31 (02) :879-887
[7]  
BOUHAFS B, 1995, IN PRESS J INFRARED
[8]   OPTICAL-PROPERTIES OF POROUS SILICON - A 1ST-PRINCIPLES STUDY [J].
BUDA, F ;
KOHANOFF, J ;
PARRINELLO, M .
PHYSICAL REVIEW LETTERS, 1992, 69 (08) :1272-1275
[9]   SILICON QUANTUM WIRE ARRAY FABRICATION BY ELECTROCHEMICAL AND CHEMICAL DISSOLUTION OF WAFERS [J].
CANHAM, LT .
APPLIED PHYSICS LETTERS, 1990, 57 (10) :1046-1048
[10]   ELECTRONIC-STRUCTURE OF LIZNN - INTERSTITIAL INSERTION RULE [J].
CARLSSON, AE ;
ZUNGER, A ;
WOOD, DM .
PHYSICAL REVIEW B, 1985, 32 (02) :1386-1389