GROWTH AND PROPERTIES OF RADIOFREQUENCY REACTIVELY SPUTTERED TITANIUM NITRIDE THIN-FILMS

被引：25

作者：

KUMAR, N ^{[1
]}

POURREZAEI, K ^{[1
]}

FISSEL, M ^{[1
]}

BEGLEY, T ^{[1
]}

LEE, B ^{[1
]}

DOUGLAS, EC ^{[1
]}

机构：

[1] RCA CORP,CTR MICROELECTR,SOMERVILLE,NJ 08876

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574494

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1778 / 1782

页数：5

共 15 条

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[6] KUMAR N, 1986, SPR P MRS M PITTSB, V68, P357
[7] KUMAR N, UNPUB THIN SOLID FIL
[8] INFLUENCE OF THE NITROGEN PARTIAL-PRESSURE ON THE PROPERTIES OF DC-SPUTTERED TITANIUM AND TITANIUM NITRIDE FILMS
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[J]. THIN SOLID FILMS, 1984, 111 (04) : 339 - 349
[9] COLOR OF TITANIUM NITRIDE PREPARED BY REACTIVE DC MAGNETRON SPUTTERING
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[10] DIFFUSION BARRIERS IN THIN-FILMS
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[J]. THIN SOLID FILMS, 1978, 52 (03) : 415 - 443