共 9 条
[1]
COMPUTER STUDIES OF DECHANNELING EFFECTS ON ION IMPLANTATION PROFILES
[J].
LETTERE AL NUOVO CIMENTO,
1971, 2 (08)
:390-+
[2]
MONTE-CARLO CALCULATIONS ON SPATIAL-DISTRIBUTION OF IMPLANTED IONS IN SILICON
[J].
RADIATION EFFECTS AND DEFECTS IN SOLIDS,
1976, 31 (01)
:41-45
[3]
DOSE DEPENDENCE OF PENETRATION AND DAMAGE PROFILES OF P+-CHANNELED IONS IN SILICON SIMULATED BY COMPUTER
[J].
RADIATION EFFECTS AND DEFECTS IN SOLIDS,
1975, 27 (1-2)
:89-95
[5]
PERIODIC DEPENDENCE OF ELECTRONIC STOPPING CROSS SECTION FOR ENERGETIC HEAVY IONS IN SOLIDS
[J].
PHYSICAL REVIEW,
1968, 173 (02)
:454-&
[6]
ISHIWARA H, 1975, 4TH P INT C ION IMPL, P423
[7]
RYSSEL H, 1977, 5TH P INT C ION IMPL, P727
[8]
ZIGNANI F, 1978, 1977 P INT C PHOT SO, P113
[9]
ZIGNANI F, 1980, RADIAT EFF, V47, P117