DOSE DEPENDENCE OF PENETRATION AND DAMAGE PROFILES OF P+-CHANNELED IONS IN SILICON SIMULATED BY COMPUTER

被引:14
作者
DESALVO, A
ROSA, R
ZIGNANI, F
机构
[1] UNIV BOLOGNA,FAC INGN,IST CHIM,BOLOGNA,ITALY
[2] CNR,LAB LAMEL,VIA CASTAGNOLI 1,40126 BOLOGNA,ITALY
来源
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1975年 / 27卷 / 1-2期
关键词
D O I
10.1080/00337577508233013
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
引用
收藏
页码:89 / 95
页数:7
相关论文
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