PROPOSAL FOR A NEW SUB-MICRON DIMENSION REFERENCE FOR AN ELECTRON-BEAM METROLOGY SYSTEM

被引：48

作者：

NAKAYAMA, Y ^{[1
]}

OKAZAKI, S ^{[1
]}

SUGIMOTO, A ^{[1
]}

机构：

[1] HITACHI LTD,MUSASHI WORKS,KODAIRA,TOKYO 187,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584135

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1930 / 1933

页数：4

共 14 条

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