EVALUATION OF SURFACE DAMAGE ON GAAS ETCHED WITH AN ELECTRON-CYCLOTRON-RESONANCE SOURCE

被引：22

作者：

KO, KK ^{[1
]}

PANG, SW ^{[1
]}

BROCK, T ^{[1
]}

COLE, MW ^{[1
]}

CASAS, LM ^{[1
]}

机构：

[1] USA,RES LAB,FT MONMOUTH,NJ 07703

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587517

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3382 / 3387

页数：6

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