CRYSTALLINE AND ELECTRICAL CHARACTERISTICS OF SILICON FILMS DEPOSITED BY IONIZED-CLUSTER-BEAMS

被引：27

作者：

YAMADA, I

SARIS, FW

TAKAGI, T

MATSUBARA, K

TAKAOKA, H

ISHIYAMA, S

机构：

[1] FOM,INST ATOOM & MOLEC FYS,AMSTERDAM,NETHERLANDS

[2] KYOTO UNIV,DEPT ELECTR,KYOTO 606,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 04期

关键词：

D O I：

10.1143/JJAP.19.L181

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：L181 / L184

页数：4

相关论文

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