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OXIDE CHARGE REDUCTION BY CHEMICAL GETTERING WITH TRICHLOROETHYLENE DURING THERMAL OXIDATION OF SILICON
被引:32
作者
:
CHEN, MC
论文数:
0
引用数:
0
h-index:
0
CHEN, MC
HILE, JW
论文数:
0
引用数:
0
h-index:
0
HILE, JW
机构
:
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1972年
/ 119卷
/ 02期
关键词
:
D O I
:
10.1149/1.2404165
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:223 / +
页数:1
相关论文
共 15 条
[1]
PREPARATION AND C-V CHARACTERISTICS OF SI-SI3N4 AND SI-SIO2-SI3N4 STRUCTURES
CHU, TL
论文数:
0
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0
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0
CHU, TL
SZEDON, JR
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0
引用数:
0
h-index:
0
SZEDON, JR
LEE, CH
论文数:
0
引用数:
0
h-index:
0
LEE, CH
[J].
SOLID-STATE ELECTRONICS,
1967,
10
(09)
: 897
-
&
[2]
CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
SKLAR, M
论文数:
0
引用数:
0
h-index:
0
SKLAR, M
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
SNOW, EH
论文数:
0
引用数:
0
h-index:
0
SNOW, EH
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967,
114
(03)
: 266
-
+
[3]
AN INVESTIGATION OF INSTABILITY AND CHARGE MOTION IN METAL-SILICON OXIDE-SILICON STRUCTURES
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(02)
: 222
-
+
[4]
STABILIZATION OF MOS DEVICES
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
SOLID-STATE ELECTRONICS,
1967,
10
(07)
: 657
-
+
[5]
EVIDENCE OF HOLE INJECTION AND TRAPPING IN SILICON NITRIDE FILMS PREPARED BY REACTIVE SPUTTERING
HU, SM
论文数:
0
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0
h-index:
0
HU, SM
KERR, DR
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0
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0
h-index:
0
KERR, DR
GREGOR, LV
论文数:
0
引用数:
0
h-index:
0
GREGOR, LV
[J].
APPLIED PHYSICS LETTERS,
1967,
10
(03)
: 97
-
&
[6]
STABILIZATION OF SIO2 PASSIVATION LAYERS WITH P2O5
KERR, DR
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0
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0
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0
KERR, DR
LOGAN, JS
论文数:
0
引用数:
0
h-index:
0
LOGAN, JS
BURKHARDT, PJ
论文数:
0
引用数:
0
h-index:
0
BURKHARDT, PJ
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
PLISKIN, WA
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1964,
8
(04)
: 376
-
&
[7]
KRIEGLER RJ, 1971, 79 PAP PRES EL SOC M
[8]
FIELD EFFECT STUDIES OF OXIDIZED SILICON SURFACE
LINDMAYER, J
论文数:
0
引用数:
0
h-index:
0
LINDMAYER, J
[J].
SOLID-STATE ELECTRONICS,
1966,
9
(03)
: 225
-
+
[9]
INVESTIGATION OF SILICON-SILICON DIOXIDE INTERFACE USING MOS STRUCTURE
MIURA, Y
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0
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0
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MIURA, Y
MATUKURA, Y
论文数:
0
引用数:
0
h-index:
0
MATUKURA, Y
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1966,
5
(02)
: 180
-
&
[10]
SILICON DIOXIDE FILMS DOPED WITH PHOSPHORUS
MIURA, Y
论文数:
0
引用数:
0
h-index:
0
MIURA, Y
TANAKA, S
论文数:
0
引用数:
0
h-index:
0
TANAKA, S
MATUKURA, Y
论文数:
0
引用数:
0
h-index:
0
MATUKURA, Y
OSAFUNE, H
论文数:
0
引用数:
0
h-index:
0
OSAFUNE, H
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1966,
113
(04)
: 399
-
&
←
1
2
→
共 15 条
[1]
PREPARATION AND C-V CHARACTERISTICS OF SI-SI3N4 AND SI-SIO2-SI3N4 STRUCTURES
CHU, TL
论文数:
0
引用数:
0
h-index:
0
CHU, TL
SZEDON, JR
论文数:
0
引用数:
0
h-index:
0
SZEDON, JR
LEE, CH
论文数:
0
引用数:
0
h-index:
0
LEE, CH
[J].
SOLID-STATE ELECTRONICS,
1967,
10
(09)
: 897
-
&
[2]
CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
SKLAR, M
论文数:
0
引用数:
0
h-index:
0
SKLAR, M
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
SNOW, EH
论文数:
0
引用数:
0
h-index:
0
SNOW, EH
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967,
114
(03)
: 266
-
+
[3]
AN INVESTIGATION OF INSTABILITY AND CHARGE MOTION IN METAL-SILICON OXIDE-SILICON STRUCTURES
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(02)
: 222
-
+
[4]
STABILIZATION OF MOS DEVICES
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
SOLID-STATE ELECTRONICS,
1967,
10
(07)
: 657
-
+
[5]
EVIDENCE OF HOLE INJECTION AND TRAPPING IN SILICON NITRIDE FILMS PREPARED BY REACTIVE SPUTTERING
HU, SM
论文数:
0
引用数:
0
h-index:
0
HU, SM
KERR, DR
论文数:
0
引用数:
0
h-index:
0
KERR, DR
GREGOR, LV
论文数:
0
引用数:
0
h-index:
0
GREGOR, LV
[J].
APPLIED PHYSICS LETTERS,
1967,
10
(03)
: 97
-
&
[6]
STABILIZATION OF SIO2 PASSIVATION LAYERS WITH P2O5
KERR, DR
论文数:
0
引用数:
0
h-index:
0
KERR, DR
LOGAN, JS
论文数:
0
引用数:
0
h-index:
0
LOGAN, JS
BURKHARDT, PJ
论文数:
0
引用数:
0
h-index:
0
BURKHARDT, PJ
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
PLISKIN, WA
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1964,
8
(04)
: 376
-
&
[7]
KRIEGLER RJ, 1971, 79 PAP PRES EL SOC M
[8]
FIELD EFFECT STUDIES OF OXIDIZED SILICON SURFACE
LINDMAYER, J
论文数:
0
引用数:
0
h-index:
0
LINDMAYER, J
[J].
SOLID-STATE ELECTRONICS,
1966,
9
(03)
: 225
-
+
[9]
INVESTIGATION OF SILICON-SILICON DIOXIDE INTERFACE USING MOS STRUCTURE
MIURA, Y
论文数:
0
引用数:
0
h-index:
0
MIURA, Y
MATUKURA, Y
论文数:
0
引用数:
0
h-index:
0
MATUKURA, Y
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1966,
5
(02)
: 180
-
&
[10]
SILICON DIOXIDE FILMS DOPED WITH PHOSPHORUS
MIURA, Y
论文数:
0
引用数:
0
h-index:
0
MIURA, Y
TANAKA, S
论文数:
0
引用数:
0
h-index:
0
TANAKA, S
MATUKURA, Y
论文数:
0
引用数:
0
h-index:
0
MATUKURA, Y
OSAFUNE, H
论文数:
0
引用数:
0
h-index:
0
OSAFUNE, H
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1966,
113
(04)
: 399
-
&
←
1
2
→