ANALYSIS AND CONTROL OF ION-BEAM PROCESSING BY OPTICAL SPECTROSCOPY

被引:2
作者
HEINRICH, F
HOFFMANN, P
机构
[1] Fraunhofer-Institut für Mikrostrukturtechnik, D-W 1000 Berlin 33
关键词
D O I
10.1016/0042-207X(93)90169-B
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Optical emission spectroscopy is presented as a versatile tool for the analysis and control of low energy ion beam processing. Using interferences in the light emitted by the beam and reflected at the wafer surface, thickness variations of thin films during etching and deposition, respectively, can be determined in situ. To demonstrate the potential of this method, results from the sputtering of silicon dioxide in argon beams and the etching of the photo resist HPR204 in oxygen/argon beams are shown. Etching rates of HPR204 are presented as a function of different beam parameters. The etch rate measurements were partly accompanied by a Doppler shift analysis of atomic oxygen emissions providing additional information on the beam divergence.
引用
收藏
页码:275 / 279
页数:5
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