THERMODYNAMICS AND KINETICS OF CHEMICAL VAPOR-DEPOSITION OF ALUMINUM NITRIDE FILMS

被引：27

作者：

PAULEAU, Y ^{[1
]}

BOUTEVILLE, A ^{[1
]}

HANTZPERGUE, JJ ^{[1
]}

REMY, JC ^{[1
]}

CACHARD, A ^{[1
]}

机构：

[1] UNIV LYON 1,DEPT PHYS MAT,F-69621 VILLEURBANNE,FRANCE

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 07期

关键词：

D O I：

10.1149/1.2129944

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1532 / 1537

页数：6

共 18 条

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[7] DETERMINATION OF COMPLEX CHEMICAL-EQUILIBRIA IN POLYPHASE SYSTEMS .2. APPLICATION TO CALCULATION OF DOMAINS OF DEPOSITION STARTING WITH VAPOR-PHASE OF SYSTEM TI-C-H-CL [J].

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[8]

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