CO2-LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF TIB2

被引：19

作者：

ELDERS, J ^{[1
]}

QUIST, PA ^{[1
]}

ROOSWIJK, B ^{[1
]}

VANVOORST, JDW ^{[1
]}

VANNIEUWKOOP, J ^{[1
]}

机构：

[1] LAICA LTV,1018 WS AMSTERDAM,NETHERLANDS

来源：

SURFACE & COATINGS TECHNOLOGY | 1991年 / 45卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(91)90212-F

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Titanium diboride (TiB2) was photothermally deposited by the reduction of TiCl4 and BCI3. A CO2 laser was the only source of activation. A temperature feedback system was developed to increase the control of the CO2-laser-induced chemical vapour deposition (LCVD) process. In the LCVD process, powder production is prevented and high growth rates are obtained. The deposition process, which was optimized with respect to the growth rate, resulted in very hard TiB2 coatings (VHN25 > 3000 kg mm-2).

引用

页码：105 / 113

页数：9

共 10 条

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