ACCELERATED FACET EROSION FORMATION AND DEGRADATION OF (AL, GA)AS DOUBLE-HETEROSTRUCTURE LASERS

被引：25

作者：

NASH, FR

HARTMAN, RL

机构：

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1980年 / 16卷 / 10期

关键词：

D O I：

10.1109/JQE.1980.1070358

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1022 / 1033

页数：12

相关论文

共 58 条

[1] OBSERVATIONS OF NEGATIVE-RESISTANCE ASSOCIATED WITH SUPERLINEAR EMISSION CHARACTERISTICS OF (AL, GA) AS DOUBLE-HETEROSTRUCTURE LASERS
ANTHONY, PJ
PAOLI, TL
HARTMAN, RL
[J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (07) : 735 - 739
[2] LEAD SILICATE OPTICAL COATINGS FOR GAAS-ALGAAS LASERS
BARNES, PA
KYLE, TR
GRODKIEWICZ, WA
VANUITERT, LG
[J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (05) : 2981 - 2982
[3] PLASMA OXIDATION OF GAAS
CHANG, RPH
SINHA, AK
[J]. APPLIED PHYSICS LETTERS, 1976, 29 (01) : 56 - 58
[4] LONG-TERM DEGRADATION OF GAAS-GA1-XALXAS DH LASERS DUE TO FACET EROSION
CHINONE, N
NAKASHIMA, H
ITO, R
[J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (03) : 1160 - 1162
[5] GAIN-INDUCED GUIDING AND ASTIGMATIC OUTPUT BEAM OF GAAS LASERS
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NASH, FR
[J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (04) : 1660 - 1672
[6] DEGRADATION OF CW GAAS DOUBLE-HETEROJUNCTION LASERS AT 300-K
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HARTMAN, RL
DASARO, LA
[J]. PROCEEDINGS OF THE IEEE, 1973, 61 (07) : 1042 - 1044
[7] IMPROVED LIGHT-OUTPUT LINEARITY IN STRIPE-GEOMETRY DOUBLE-HETEROSTRUCTURE (AL,GA)AS LASERS
DIXON, RW
NASH, FR
HARTMAN, RL
HEPPLEWHITE, RT
[J]. APPLIED PHYSICS LETTERS, 1976, 29 (06) : 372 - 374
[8] POSSIBLE MODEL FOR SUSTAINED OSCILLATIONS (PULSATIONS) IN (AL,GA)AS DOUBLE-HETEROSTRUCTURE LASERS
DIXON, RW
JOYCE, WB
[J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1979, 15 (06) : 470 - 474
[9] RELATIONSHIP OF LIGHT-OUTPUT NONLINEARITIES AND LIGHT-OUTPUT SPIKES IN PROTON-BOMBARDED STRIPE-GEOMETRY DOUBLE-HETEROSTRUCTURE (AL,GA)AS LASERS
DIXON, RW
JOYCE, WB
MILLER, RC
[J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) : 1128 - 1130
[10] CURRENT DIRECTIONS IN GAAS-LASER DEVICE DEVELOPMENT
DIXON, RW
[J]. BELL SYSTEM TECHNICAL JOURNAL, 1980, 59 (05): : 669 - 722

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