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OXIDANT TRANSPORT DURING STEAM OXIDATION OF SILICON
被引:20
作者
:
MIKKELSEN, JC
论文数:
0
引用数:
0
h-index:
0
MIKKELSEN, JC
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1981年
/ 39卷
/ 11期
关键词
:
D O I
:
10.1063/1.92601
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:903 / 905
页数:3
相关论文
共 12 条
[1]
GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
[J].
JOURNAL OF APPLIED PHYSICS,
1965,
36
(12)
: 3770
-
&
[2]
Doremus RH., 1969, Reactivity of solids, P667
[3]
WATER CONTAMINATION IN THERMAL OXIDE ON SILICON
HOLMBERG, GL
论文数:
0
引用数:
0
h-index:
0
HOLMBERG, GL
KUPER, AB
论文数:
0
引用数:
0
h-index:
0
KUPER, AB
MIRALDI, FD
论文数:
0
引用数:
0
h-index:
0
MIRALDI, FD
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970,
117
(05)
: 677
-
+
[4]
DEUTERIUM AT THE SI-SIO2 INTERFACE DETECTED BY SECONDARY-ION MASS-SPECTROMETRY
JOHNSON, NM
论文数:
0
引用数:
0
h-index:
0
机构:
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
JOHNSON, NM
BIEGELSEN, DK
论文数:
0
引用数:
0
h-index:
0
机构:
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
BIEGELSEN, DK
MOYER, MD
论文数:
0
引用数:
0
h-index:
0
机构:
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
MOYER, MD
DELINE, VR
论文数:
0
引用数:
0
h-index:
0
机构:
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
DELINE, VR
EVANS, CA
论文数:
0
引用数:
0
h-index:
0
机构:
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
EVANS, CA
[J].
APPLIED PHYSICS LETTERS,
1981,
38
(12)
: 995
-
997
[5]
THE MECHANISMS FOR SILICON OXIDATION IN STEAM AND OXYGEN
LIGENZA, JR
论文数:
0
引用数:
0
h-index:
0
LIGENZA, JR
SPITZER, WG
论文数:
0
引用数:
0
h-index:
0
SPITZER, WG
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1960,
14
: 131
-
136
[6]
CHARACTERIZATION OF WET (D2O) THERMAL-OXIDATION OF SILICON BY SECONDARY ION MASS-SPECTROMETRY
MIKKELSEN, JC
论文数:
0
引用数:
0
h-index:
0
MIKKELSEN, JC
[J].
APPLIED PHYSICS LETTERS,
1981,
39
(08)
: 601
-
603
[7]
STEAM THERMAL SIO2 - PREPARATION AND RAMAN CHARACTERIZATION OF FREE-STANDING FILMS
MIKKELSEN, JC
论文数:
0
引用数:
0
h-index:
0
MIKKELSEN, JC
GALEENER, FL
论文数:
0
引用数:
0
h-index:
0
GALEENER, FL
[J].
APPLIED PHYSICS LETTERS,
1980,
37
(08)
: 712
-
714
[8]
WATER IN SILICA GLASS
MOULSON, AJ
论文数:
0
引用数:
0
h-index:
0
MOULSON, AJ
ROBERTS, JP
论文数:
0
引用数:
0
h-index:
0
ROBERTS, JP
[J].
TRANSACTIONS OF THE FARADAY SOCIETY,
1961,
57
(08):
: 1208
-
&
[9]
NETWORK OXYGEN-EXCHANGE DURING WATER DIFFUSION IN SIO2
PFEFFER, R
论文数:
0
引用数:
0
h-index:
0
机构:
STEVENS INST TECHNOL,HOBOKEN,NJ 07030
STEVENS INST TECHNOL,HOBOKEN,NJ 07030
PFEFFER, R
OHRING, M
论文数:
0
引用数:
0
h-index:
0
机构:
STEVENS INST TECHNOL,HOBOKEN,NJ 07030
STEVENS INST TECHNOL,HOBOKEN,NJ 07030
OHRING, M
[J].
JOURNAL OF APPLIED PHYSICS,
1981,
52
(02)
: 777
-
784
[10]
RIGO S., 1980, PHYSICS MOS INSULATO, P167
←
1
2
→
共 12 条
[1]
GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
[J].
JOURNAL OF APPLIED PHYSICS,
1965,
36
(12)
: 3770
-
&
[2]
Doremus RH., 1969, Reactivity of solids, P667
[3]
WATER CONTAMINATION IN THERMAL OXIDE ON SILICON
HOLMBERG, GL
论文数:
0
引用数:
0
h-index:
0
HOLMBERG, GL
KUPER, AB
论文数:
0
引用数:
0
h-index:
0
KUPER, AB
MIRALDI, FD
论文数:
0
引用数:
0
h-index:
0
MIRALDI, FD
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970,
117
(05)
: 677
-
+
[4]
DEUTERIUM AT THE SI-SIO2 INTERFACE DETECTED BY SECONDARY-ION MASS-SPECTROMETRY
JOHNSON, NM
论文数:
0
引用数:
0
h-index:
0
机构:
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
JOHNSON, NM
BIEGELSEN, DK
论文数:
0
引用数:
0
h-index:
0
机构:
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
BIEGELSEN, DK
MOYER, MD
论文数:
0
引用数:
0
h-index:
0
机构:
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
MOYER, MD
DELINE, VR
论文数:
0
引用数:
0
h-index:
0
机构:
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
DELINE, VR
EVANS, CA
论文数:
0
引用数:
0
h-index:
0
机构:
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
EVANS, CA
[J].
APPLIED PHYSICS LETTERS,
1981,
38
(12)
: 995
-
997
[5]
THE MECHANISMS FOR SILICON OXIDATION IN STEAM AND OXYGEN
LIGENZA, JR
论文数:
0
引用数:
0
h-index:
0
LIGENZA, JR
SPITZER, WG
论文数:
0
引用数:
0
h-index:
0
SPITZER, WG
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1960,
14
: 131
-
136
[6]
CHARACTERIZATION OF WET (D2O) THERMAL-OXIDATION OF SILICON BY SECONDARY ION MASS-SPECTROMETRY
MIKKELSEN, JC
论文数:
0
引用数:
0
h-index:
0
MIKKELSEN, JC
[J].
APPLIED PHYSICS LETTERS,
1981,
39
(08)
: 601
-
603
[7]
STEAM THERMAL SIO2 - PREPARATION AND RAMAN CHARACTERIZATION OF FREE-STANDING FILMS
MIKKELSEN, JC
论文数:
0
引用数:
0
h-index:
0
MIKKELSEN, JC
GALEENER, FL
论文数:
0
引用数:
0
h-index:
0
GALEENER, FL
[J].
APPLIED PHYSICS LETTERS,
1980,
37
(08)
: 712
-
714
[8]
WATER IN SILICA GLASS
MOULSON, AJ
论文数:
0
引用数:
0
h-index:
0
MOULSON, AJ
ROBERTS, JP
论文数:
0
引用数:
0
h-index:
0
ROBERTS, JP
[J].
TRANSACTIONS OF THE FARADAY SOCIETY,
1961,
57
(08):
: 1208
-
&
[9]
NETWORK OXYGEN-EXCHANGE DURING WATER DIFFUSION IN SIO2
PFEFFER, R
论文数:
0
引用数:
0
h-index:
0
机构:
STEVENS INST TECHNOL,HOBOKEN,NJ 07030
STEVENS INST TECHNOL,HOBOKEN,NJ 07030
PFEFFER, R
OHRING, M
论文数:
0
引用数:
0
h-index:
0
机构:
STEVENS INST TECHNOL,HOBOKEN,NJ 07030
STEVENS INST TECHNOL,HOBOKEN,NJ 07030
OHRING, M
[J].
JOURNAL OF APPLIED PHYSICS,
1981,
52
(02)
: 777
-
784
[10]
RIGO S., 1980, PHYSICS MOS INSULATO, P167
←
1
2
→